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CPM Seminar
Jacques Beauvais
Départment de génie électrique et de génie
informatique The industry roadmap for microelectronics predicts sub-100 nm devices before the end of the next decade. At this scale, quantum effects will play an important part of device operation and much fundamental research remains to be done on such devices in order to improve their modelling and design. In particular, much work is under way in quantum effect devices such as quantum point contacts and quantum wire arrays. Electron beam lithography is a versatile research tool for this type of device fabrication. It is being used at the Université de Sherbrooke for producing a variety of nanostructures on both III-V semiconductors and silicon. This technique will be discussed as well as the results obtained for some quantum effect devices.
Thrusday, November 20th, 15:30 |